Product Information
RKD Engineering’s Elite Etch incorporates the latest innovations. The etch head is machined from premium grade silicon carbide for its extreme acid and temperature resistance. Coupled with an active nitrogen gas monitoring and purge system, this monolithic design to reduces the fuming of residual acids left on the etch head after each decapsulation process. The silicon carbide etch head enables short heat-up times with high thermal conductivity.
Specifications
Etcher Unit | Height: 300 mm (13 in) |
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Width: 190 mm (7.5 in) | |
Depth: 305 mm (12 in) | |
Bottle Assembly | Height: 254 mm (10 in) |
Width: 280 mm (11 in) | |
Depth: 127 mm (5 in) | |
Weight | Approx. 16 kg (35 lb) |
Power Source | 90 to 250 VAC, 50 to 60 Hz (4 amp) |
Acid temp. range | 20° to 250° C |
Acid temp. set point | 1° C ± 1% of setting |
Etch cavity (up to) | 22 mm x 22 mm (30 mm diagonal) |
Choice of Acids | fuming nitric acids, mixed fuming nitric and sulfuric acids, or fuming/concentrated sulfuric acid |
Acid Mix Ratios | (nitric to sulfuric ratios) 9:1, 5:1, 4:1, 3:1, 2:1, 1:1 |
Post Etch Rinse Options | sulfuric acids, fuming nitric acids, mixed acids, or no rinse |
Etch Times | 1 to 1,800 seconds in 1 second increments (1 seconds to 30 minutes) dynamic (real time) adjustments of etch time |
Etch Temperature Ranges | 20° to 90° C (nitric acid), 20° to 250° C (sulfuric acid), 20° to 100° C (mixed acids) |
Etchant Volume Selection | 1 to 6 ml per minute - for all acids & acid mixes |
Operator Program Storage | 100 programs stored to nonvolatile memory |
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